The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

17 Nanocarbon Technology » 17.2 Graphene

[21p-S011-1~20] 17.2 Graphene

Mon. Mar 21, 2016 1:45 PM - 7:00 PM S011 (S0)

Akinobu Kanda(Univ. of Tsukuba), Shintaro Sato(Fujitsu Lab.)

5:30 PM - 5:45 PM

[21p-S011-15] Sub-10 nm wide suspended graphene nanoribbon by HIM

Marek Schmidt1, 〇Ohta Takechi1, Teruhisa Kanzaki1, Shinichi Ogawa2, Hiroshi Mizuta1,3 (1.JAIST, 2.AIST, 3.Univ. of Southampton)

Keywords:graphene,suspended,helium ion microscopy

Helium ion microscopy (HIM) and milling are known for highest resolution. It is therefore actively employed for graphene device fabrication and modification. However, when the necessary dose to modify the graphene exceeds a certain value, the substrate starts to swell due to helium bubble formation. This deformation can cause damage to the graphene and methods to mitigate this are actively searched. Here, we avoid damage from substrate swelling by suspending the graphene. Additionally, knock-on damage from the beam-substrate interaction is reduced, leading to sub-10 nm resolution.