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[21p-W521-16] High-carrier-mobility field-effect transistors based on organic-inorganic perovskite semiconductors
Keywords:Organic-inorganic perovskite,Field-effect transistor,Surface treatment
In this study, we have demonstrated that surface treatment of a gate insulator surface with NH3I-SAM markedly improves perovskite film quality and transistor performance. A reason for high-quality perovskite films formed is that the NH3I terminal groups on the substrate work as part of the perovskite structure. This surface treatment provides a significantly improved field-effect hole mobility up to 12 cm2 V–1 s–1 (7.7 cm2 V–1 s–1 on average), which is the highest value in all perovskite transistors.