The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

13 Semiconductors » 13.9 Optical properties and light-emitting devices

[22a-S423-1~12] 13.9 Optical properties and light-emitting devices

Tue. Mar 22, 2016 9:00 AM - 12:15 PM S423 (S4)

Takashi Kunimoto(Tokushima Bunri Univ.)

9:00 AM - 9:15 AM

[22a-S423-1] Luminescence of Silicon nanocrystals treated by High-pressure Water Vapor Annealing

Bernard Gelloz1, Firman Bagja Juangsa2, Tomohiro Nozaki2, Lianhua Jin3, Nobuyoshi Koshida4 (1.Nagoya Univ., 2.Tokyo Inst. Tech., 3.Yamanashi Univ., 4.Tokyo Univ. Agr.&Tech.)

Keywords:silicon nanocrystals,passivation,photoluminescence

We report a study of the luminescence of SiNCs fabricated by a non-thermal plasma technique. The SiNCs are spherical and exhibit an average size of about 6 nm. They were not luminescent in as-prepared state. In order to reduce their sizes as well as to provide a good oxide surface passivation, they were treated by high-pressure water vapor annealing (HWA). The resulting oxide passivated SiNCs exhibit bright photoluminescence.