2016年第63回応用物理学会春季学術講演会

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13 半導体 » 13.9 光物性・発光デバイス

[22a-S423-1~12] 13.9 光物性・発光デバイス

2016年3月22日(火) 09:00 〜 12:15 S423 (南4号館)

國本 崇(徳島文理大)

09:00 〜 09:15

[22a-S423-1] Luminescence of Silicon nanocrystals treated by High-pressure Water Vapor Annealing

Gelloz Bernard1、Juangsa Firman Bagja2、Nozaki Tomohiro2、Jin Lianhua3、Koshida Nobuyoshi4 (1.Nagoya Univ.、2.Tokyo Inst. Tech.、3.Yamanashi Univ.、4.Tokyo Univ. Agr.&Tech.)

キーワード:silicon nanocrystals,passivation,photoluminescence

We report a study of the luminescence of SiNCs fabricated by a non-thermal plasma technique. The SiNCs are spherical and exhibit an average size of about 6 nm. They were not luminescent in as-prepared state. In order to reduce their sizes as well as to provide a good oxide surface passivation, they were treated by high-pressure water vapor annealing (HWA). The resulting oxide passivated SiNCs exhibit bright photoluminescence.