The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

Joint Session K » Joint Session K

[22p-S222-1~9] 21.1 Joint Session K

Tue. Mar 22, 2016 12:30 PM - 2:45 PM S222 (S2)

Toshio Kamiya(Titech)

1:45 PM - 2:00 PM

[22p-S222-6] Effect of Hydrogen Plasma Treatment on Solution-Processed Oxide Semiconductor TFT

Masashi Miyakawa1, Mitsuru Nakata1, Hiroshi Tsuji1, Yoshihide Fujisaki1, Toshihiro Yamamoto1 (1.NHK)

Keywords:Oxide Semiconductor,TFT