Takashi Kojima

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

4:15 PM - 4:30 PM

△ [7p-A402-12] Time evolution of radical deposition rate in the downstream region of high-pressure multi-hollow discharge plasma CVD

〇Takashi Kojima¹, Susumu Toko¹, Kazuma Tanaka¹, Hyunwoohg Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)