Maria Balois

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Speaker, Author, Co-Author

Fri. Sep 8, 2017 1:30 PM - 3:30 PM PA2 (P)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[8p-PA2-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

1:30 PM - 3:30 PM

▲ [8p-PA2-2] Precise characterization of strained silicon nanomembrane edge-induced stress gradient in nanowire arrays via polarized Raman microscopy and imaging

〇(PC)Maria Balois¹, Lean Dasallas², Oussama Moutanabbir³, Takuo Tanaka¹, Norihiko Hayazawa^1,4 (1.Photon Team - RIKEN, 2.NIP - UP, 3.Ecole P. Montreal, 4.SISL - RIKEN)

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