Session information

Oral presentation

8 Plasma Electronics » 8.8 Plasma Electronics English Session

[5p-S22-3~4] 8.8 Plasma Electronics English Session

Tue. Sep 5, 2017 2:30 PM - 3:00 PM S22 (Palace B)

Osamu Sakai(Univ. of Shiga Pref.)

△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
空欄：どちらもなし

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2:30 PM - 2:45 PM

▲ [5p-S22-3] Evaluation of Nickel Self-Sputtering Yields by Molecular Dynamics Simulation

〇Nicolas Aini Mauchamp¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (1.Osaka University)

2:45 PM - 3:00 PM

▲ [5p-S22-4] Attempt of Liquid-Phase Material Processing Using Atmospheric-Pressure Glow Discharge Electrolysis

〇Fumiyoshi Tochikubo¹, Yuya Yamazaki¹, Takumi Hanawa¹, Naoshi Kitakaze¹, Naoki Shirai², Satoshi Uchida¹ (1.Tokyo Metropolitan Univ., 2.Hokkaido Univ.)

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