Oral presentation
8 Plasma Electronics » 8.1 Plasma production and control
Thu. Sep 7, 2017 4:00 PM - 6:30 PM A413 (413)
Hiroshi Akatsuka(Titech)
△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
空欄：どちらもなし
4:00 PM - 4:15 PM
〇LIZHU TONG1 (1.Keisoku Eng. Sys.)
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4:15 PM - 4:30 PM
〇(M2)Kazuma Ohki1, Akinori Oda1, Takayuki Ohta2, Hiroyuki Kousaka3 (1.Chiba inst. Technol., 2.Meijo Univ., 3.Gifu Univ.)
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4:30 PM - 4:45 PM
〇Shigeyuki Takagi1, Daisuke Nose1 (1.Tokyo Univ. of Tech.)
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4:45 PM - 5:00 PM
〇Rui Chiba1, Kyouhei Harashima1, Yuuichi Tamura1, Tatsuo Ishijima1, Yasunori Tanaka1, Yoshihiko Uesugi1 (1.Kanazawa Univ.)
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5:00 PM - 5:15 PM
〇Katsuhisa Kitano1, Mika Yoshida1, Mitsutoshi Aramaki2, Kei Shinada3, Satoshi Matsuoka3 (1.Eng. Osaka Univ., 2.Nihon Univ., 3.Shimadzu Co.)
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5:30 PM - 5:45 PM
〇Hideki Yajima1, Kotaro Ogawa2, Hiroshi Furuta2, Akimitsu Hatta2 (1.ORC Manufacturing, 2.Kochi Univ. Technol.)
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5:45 PM - 6:00 PM
〇(M1)Kaede Katsuno1, Kenji Ishikawa1, Takayoshi Tsutsumi1, Keigo Takeda1, Hiroshi Hashizume1, Hiromasa Tanaka1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (1.Nagoya Univ.)
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6:00 PM - 6:15 PM
〇Hikaru Senba1, Yosuke Koike1, Haruka Suzuki1, Hirotaka Toyoda1 (1.Nagoya Univ.)
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6:15 PM - 6:30 PM
〇Hiroaki Hanafusa1, Ryosuke Nakashima1, Seiichiro Higashi1 (1.Hiroshima Univ.)
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