The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[5p-A202-1~18] 6.3 Oxide electronics

Tue. Sep 5, 2017 1:15 PM - 6:00 PM A202 (202)

Hisashi Shima(AIST), Yusuke Nishi(Kyoto Univ.)

3:45 PM - 4:00 PM

[5p-A202-10] Non-Destructive Observation of Chemical State in ReRAM
by Laser-excited Photoemission Electron Microscopy

〇(M2)Junpei Kawakita1,2, Hisashi Shima2,3, Yasuhisa Naitoh2,3, Hiro Akinaga2,3, Toshiyuki Taniuchi1,2, Shik Shin1,2 (1.ISSP, Univ. of Tokyo, 2.AIST-UTokyo OPERANDO-OIL, 3.NeRI-AIST)

Keywords:ReRAM, PEEM, operando measurement

We have demonstrated the nondestructive imaging of chemical states of Resistive Random Access Memory (ReRAM) devices using laser-excited photoemission electron microscopy. High resistance states (HRS) and low resistance states (LRS) in oxide layers beneath 10 nm thick top electrodes were observed from top view. We have succeeded in visualization nucleation and the re-oxidization of conductive filaments in the oxide layers. This new technique will accelerate research and development for various types of electronic devices.