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6 Thin Films and Surfaces » 6.3 Oxide electronics

[5p-A202-1~18] 6.3 Oxide electronics

Tue. Sep 5, 2017 1:15 PM - 6:00 PM A202 (202)

Hisashi Shima(AIST), Yusuke Nishi(Kyoto Univ.)

2:30 PM - 2:45 PM

[5p-A202-6] Correlation between NiO crystallinity and forming characteristics in Pt/NiO/Pt stacks

〇Yusuke Nishi¹, Tsunenobu Kimoto¹ (1.Kyoto Univ.)

Keywords:ReRAM