2017年第78回応用物理学会秋季学術講演会

講演情報

一般セッション(ポスター講演)

16 非晶質・微結晶 » 16.3 シリコン系太陽電池

[5p-PB3-1~26] 16.3 シリコン系太陽電池

2017年9月5日(火) 13:30 〜 15:30 PB3 (国際センター2F)

13:30 〜 15:30

[5p-PB3-10] Applying selective emitter to industrial PERC cells using a screen-printed resist masking combined with wet chemical etch-back process

〇(P)Supawan Joonwichien1、Yasuhiro Kida1、Satoshi Utsunomiya1、Maasaki Moriya1、Katsuhiko Shirasawa1、HIdetaka Takato1 (1.AIST)

キーワード:PERC, Selective emitter

We report on our attempt to improve the performance of passivated emitter and rear cell (PERC) performance by introducing a selective emitter technology using a screen-printed resist masking combined with wet chemical etch-back process. Applying selective emitter concept is aimed to decrease the recombination losses at the front surface of the cell.