13:45 〜 14:30
▲ [5p-S22-2] [INVITED] Advances in nitride film and coating growth by chemical vapor deposition
キーワード：Chemical Vapor Deposition, Aluminum nitride, Coating
Modification of surface properties by depositing ceramic thin films on substrates is a common technology to improve the performance of tools and components for many different industrial applications, such as photo-catalysis, optical coatings, sensors, integrated optics, metal-cutting industry, or microelectronic devices. There are various techniques to prepare nitride thin films and coatings such as sol-gel method, physical vapor deposition (PVD) and chemical vapor deposition (CVD). Among these techniques, CVD is an advanced manufacturing and straightforward technique for the depositing homogeneous films with a good step coverage even on complex shapes. In addition, CVD methods can produce single layer, multilayer, composite, nanostructured and functionally graded coating materials with well controlled dimension and unique structures in a short time. Assisted or Enhanced CVD techniques by plasma, laser or hot wire allow lower temperature deposition (<500 °C) than those required by standard chemical vapor deposition (>800 °C for nitrides). In the same way, thin films can be deposited by metal-organic chemical vapor deposition (MOCVD) on substrates requiring low temperature processing. When only tens of nanometers films and very low temperature (<300 °C) are required, Atomic Layer Deposition (ALD and Plasma ALD) is a technique of choice for medical and textile applications.
In the present talk, firstly, the different CVD methods, their advantages and drawbacks and the market served are reviewed and discussed. Secondly, a special focus will be made on the different applications of AlN thin films and coatings processed at high temperature and the ways to tailor their function (deep UV, piezoelectric, HT barrier …) with operating parameters and microstructure. At last, the review will present advanced materials and potential applications.
In the present talk, firstly, the different CVD methods, their advantages and drawbacks and the market served are reviewed and discussed. Secondly, a special focus will be made on the different applications of AlN thin films and coatings processed at high temperature and the ways to tailor their function (deep UV, piezoelectric, HT barrier …) with operating parameters and microstructure. At last, the review will present advanced materials and potential applications.