The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[6a-A203-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Wed. Sep 6, 2017 9:00 AM - 11:45 AM A203 (203)

Mamoru Furuta(Kochi Univ. of Tech.)

9:00 AM - 9:15 AM

[6a-A203-1] Deconvolution of near-valence band maximum states in amorphous oxide semiconductor

Keisuke Ide1, Yosuke Kishida1, Takayoshi Katase1, Hidenori Hiramatsu1,2, Shigenori Ueda3, Hideya Kumomi2, Hideo Hosono1,2, Toshio Kamiya1,2 (1.MSL, Tokyo Tech., 2.MCES, Tokyo Tech., 3.NIMS)

Keywords:amorphous oxide semiconductor, defect, photo electron microscopy

Amorphous oxide semiconductor shows response to the visible light even though the bandgap is ~3.0 eV. This is attributed to large amount of defect states just above valence band maximum. However, the origin of this state have not been clear. In this study, we used difference-method from photo-electron spectrum to distinguish and extract several origin, such as void, hydrogen, and vacancy.