2017年第78回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

10 スピントロニクス・マグネティクス » 10.2 スピン基盤技術・萌芽的デバイス技術

[6a-C18-1~12] 10.2 スピン基盤技術・萌芽的デバイス技術

10.1と10.2と10.3のコードシェアセッションあり

2017年9月6日(水) 09:00 〜 12:00 C18 (C18)

齋藤 秀和(産総研)

10:45 〜 11:00

[6a-C18-8] Gate dependence of the ISHE-induced electromotive force in a thin platinum film

Masaya Hokazono1、Sergey Dushenko1、Kohji Nakamura2、Yuichiro Ando1、Teruya Shinjo1、Masashi Shiraishi1 (1.Kyoto Univ.、2.Mie Univ.)

キーワード:inverse spin Hall effect, spin pumping

Amongst the broad range of systems and materials in which inverse spin Hall effect (ISHE) was studied, platinum (Pt) attracts special attention due to the presence of the large spin-orbit interaction. In this study, we report tuning of the ISHE in Pt by an applied electric gate. The spin pumping drove pure spin current into the adjacent Pt layer. After the spin-charge conversion due to the ISHE, the generated charge current was detected at the ends of the Pt film. Under the application of gate voltage using the ionic gel (DEME-TFSI), we observe strong modulation of both sample resistance and the electromotive generated due to the ISHE. Experimental results are compared to the theoretical band calculations. The influence of the applied gate voltage on the ISHE in Pt is discussed in detail.