2:30 PM - 2:45 PM
△ [6p-C17-4] Plane-direction dependence of NiO growth on α-Al2O3 substrates by mist CVD method
Keywords:Mist CVD, Nickel Oxide, Oxide semiconductor
Presentation information
Oral presentation
21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
[6p-C17-1~15] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
Wed. Sep 6, 2017 1:45 PM - 5:45 PM C17 (Training Room 2)
Hisao Makino(Kochi Univ. of Tech.)