2017年第78回応用物理学会秋季学術講演会

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6 薄膜・表面 » 6.4 薄膜新材料

[6p-C23-1~16] 6.4 薄膜新材料

2017年9月6日(水) 13:45 〜 18:15 C23 (C23)

中村 吉伸(東大)、西川 博昭(近畿大)

17:30 〜 17:45

[6p-C23-14] Transport properties of single-crystalline TiSe2 epitaxial thin films grown by molecular-beam epitaxy

Yue Wang1、Masaki Nakano1、Yuta Kashiwabara1、Masaro Yoshida2、Yoshihiro Iwasa1,2 (1.Univ. of Tokyo、2.RIKEN CEMS)

キーワード:2D materials, Transition-metal dichalcogenide, Molecular-beam epitaxy

Transitional-metal dichalcogenides (TMDC) with reduced thickness are one of the most important branches in 2D materials researches due to their novel properties that are different from their bulk counterparts. 1T-TiSe2, one of semiconducting TMDC with a negative band gap (i.e. a semimetal), possesses a charge-density wave (CDW) ground state with the transition temperature of about T = 200 K in a bulk, which is competitive to a superconducting phase. Here, we report on epitaxial growth of single-crystalline 1T-TiSe2 thin films by molecular-beam epitaxy (MBE), and discuss their transport properties.