The 78th JSAP Autumn Meeting, 2017

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[7a-A413-1~9] 8.1 Plasma production and control

Thu. Sep 7, 2017 9:00 AM - 11:30 AM A413 (413)

Akimitsu Hatta(Kochi Univ. of Tech.)

9:00 AM - 9:15 AM

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

〇Yuto Tsuda1, Takuto Watanabe1, Koji Onishi1, Tatsuto Takeda1, Takashi Uchida2, Masayuki Muramatsu3, Atsushi Kitagawa3, Yoshikazu Yoshida2, Yushi Kato1 (1.Osaka univ., 2.Toyo univ., 3.NIRS)

Keywords:Fullerene, plasma