[7a-A413-1~9] 8.1 Plasma production and control

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams

〇Tatsuto Takeda¹, Yuto Tsuda¹, Takuto Watanabe¹, Koji Onishi¹, Kouta Hamada¹, Yasutaka Inanaga², Yushi Kato¹ (1.Osaka Univ., 2.Mitsubishi Electric)

Keywords:plasma