Fabrication and Characterization of Cu<sub>2</sub>O Thin Films by Mist CVD Method

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

Fri. Sep 8, 2017 9:00 AM - 12:00 PM A202 (202)

9:45 AM - 10:00 AM

〇Ryo Wakashima¹, Toshikazu Kawai¹, Takumi Ikenoue¹, Masao Miyake¹, Tetsuji Hirato¹ (1.Kyoto Univ.)

Keywords:semiconductor, cuprous oxide, mist CVD method