The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

8 Plasma Electronics » 8.5 Plasma nanotechnology

[8a-A402-1~9] 8.5 Plasma nanotechnology

Fri. Sep 8, 2017 9:15 AM - 11:45 AM A402 (402+403)

Giichiro Uchida(Osaka Univ.)

10:30 AM - 10:45 AM

[8a-A402-5] Silicon Plasma Nitiridation with Gold Nanoparticles on Surface

Takeshi Kitajima1, Yuuki Kariya1, Toshiki Nakano1 (1.Nat. Def. Acad.)

Keywords:Nanoparticle, Catalyst, Plasma CVD

Catalytic property of gold nanoparticles (Au-NP) is interested recent years. We investigate the catalysis of the Au-NP in a film growth using low temperature plasma. The aim of the work is to ease the plasma induced damage and enhance the processing rate. Au-NP on Si(100) sample with a native oxide is formed by an e-beam evaporation. N2 plasma exposure to the sample nitrides the Si surface as fast as the case without Au-NP. Catalysis of Au-NP is assured.