[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1] Preparing of multi-elements thin films using powder target for fuel cells

〇Hiroharu Kawasaki¹, Hikaru Yoshino¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Masanori Shinohara¹, Yoshihiro Nojiri¹ (1.Nat. inst. Tech. Sasebo)

Keywords:Powder target, Plasma Process, Spttering deposition

With the plasma process method using a granular material target, the solid electrolyte which can be used for one-room type SOFC was made as an experiment. The character of the thin film was investigated. Production of the fuel cell was tried. The produced thin film was analyzed by SEM. The surface was flat and square average coarseness was around 10 nm in spite of using the powder material targets. Film thickness was was 79 nm, measured by the alpha-step type level difference measurement system.