The 78th JSAP Autumn Meeting, 2017

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8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

9:30 AM - 11:30 AM

△ [8a-PB4-8] Spectroscopic in-situ Measurements during SiO:CH Deposition by ICP-CVD

〇(B)masato seitou1, Toshiki Hirai1, Takumi Aihara1, Yasusi Inoue1, Osamu Takai2 (1.Chibakoudai Inst., 2.Kantou Gakuin Univ.)

Keywords:Thin film, Plasma