The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[8p-A411-1~10] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Fri. Sep 8, 2017 1:15 PM - 4:00 PM A411 (411)

Koichiro Saga(Sony)

3:45 PM - 4:00 PM

[8p-A411-10] Chemical Compatibility Study of Polyarylsulfone Membrane Filter

Tomoyuki Takakura1, Shuichi Tsuzuki1 (1.Nihon Pall Ltd.)

Keywords:filter, semiconductor, filtration

Filtration plays an important role for removing particles in the chemicals used for the semiconductor wet processes. Since filters are used in various kinds of chemicals, it is necessary to confirm the compatibility to the chemical to be used. In this presentation, we report on compatibility evaluation of polyarylsulfone membrane filters to dilute sulfuric acid and hydrogen peroxide solutions, which are commonly used in the wet processes, by means of forward flow test which is one of filter’s integrity evaluation methods.