[8p-A411-1~10] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[8p-A411-7] Electrostatic Discharge Prevention in the Ultra-Pure Water Spray Cleaning of Semiconductor Chips using Induction Charging.

〇Yoshiyuki Seike¹, Taiki Tangiku¹, Yoshinori Kobayashi², Keiji Miyachi², Masahiko Amari², Tatsuo Mori¹ (1.Aichi Insit. Tech., 2.Asahi Sunac)

Keywords:semiconductor, electrostatic dischrage, spray cleaning

In semiconductor manufacturing, wet cleaning process by the ultra-pure water spray has been noticed. However, this cleaning method has problem that electrostatic discharge occur to spray ultra-pure water of high resistivity. In this report, we propose new electrostatic discharge prevention in the ultra-pure water spray cleaning of semiconductor chips using the induction charging and confirm effects it by the experiments.