Investigation of the process window in MOCVD growth BiFeO<sub>3</sub> thin films

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

Fri. Sep 8, 2017 1:30 PM - 5:00 PM A504 (504+505)

Wataru Sakamoto(Nagoya Univ.), Takeshi Yoshimura(Osaka Pref. Univ.)

2:30 PM - 2:45 PM

〇Nao Yoshimura¹, Hironori Fujisawa¹, Seiji Nakashima¹, Masaru Shimizu¹ (1.Univ. of Hyogo)

Keywords:MOCVD, BFO thin films, process window