Inclining Angle Sensitivity Characteristics of MEMS Inertial Sensor Fabricated by Multi-Layer Metal Technology

Tatsuya Koga; Ippei Tsuji; Motohiro Takayasu; Hiroyuki Ito; Daisuke Yamane; Shiro Dosho; Toshifumi Konishi; Noboru Ishihara; Katsuyuki Machida; Kazuya Masu

Presentation information

Poster presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[8p-PA2-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

Fri. Sep 8, 2017 1:30 PM - 3:30 PM PA2 (P)

1:30 PM - 3:30 PM

△ [8p-PA2-16] Inclining Angle Sensitivity Characteristics of MEMS Inertial Sensor Fabricated by Multi-Layer Metal Technology

〇Tatsuya Koga^1,3, Ippei Tsuji^1,3, Motohiro Takayasu^1,3, Hiroyuki Ito^1,3, Daisuke Yamane^1,3, Shiro Dosho^1,3, Toshifumi Konishi^1,2,3, Noboru Ishihara^1,3, Katsuyuki Machida^1,3, Kazuya Masu^1,3 (1.Tokyo Tech, 2.NTT-AT, 3.JST-CREST)

Keywords:Multi-Layer Metal Technology, MEMS Inertial Sensor, Inclining Angle Sensitivity Characteristics