Hideyuki Okamura

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F201 (F201)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[15a-F201-1~12] 15.7 Crystal evaluation, impurities and crystal defects

11:30 AM - 11:45 AM

[15a-F201-10] Effects of nitrogen doping on the oxygen precipitation in the ultra-high temperature RTP wafers

〇Hideyuki Okamura¹, Haruo Sudo¹, Kozo Nakamura³, Susumu Maeda¹, Koji Sueoka² (1.GlobalWafers Japan, 2.Faculty of Computer Science and System Engineering, Okayama Prefectural Univ., 3.Regional Cooperative Research Organization, Okayama Prefectural Univ.)

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