Ryosuke Nakashima

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 9:15 AM - 12:00 PM 304 (304)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[14a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:45 AM - 11:00 AM

[14a-304-6] Evaluation of Heating Characteristics of High Power Atmospheric Pressure Thermal-Plasma-Jet and Control of Crystal Growth of Silicon Thin Films

〇Ryosuke Nakashima¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)