Seita Beppu

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Speaker, Author, Co-Author

Thu. Mar 16, 2017 1:30 PM - 3:30 PM P3 (BP)

Poster presentation
| 6 Thin Films and Surfaces
| 6.2 Carbon-based thin films

[16p-P3-1~23] 6.2 Carbon-based thin films

1:30 PM - 3:30 PM

[16p-P3-17] High-aspect-ratio dry-etching process for diamond using SiO_x hard mask

〇Seita Beppu¹, Osamu Maida¹, Toshimichi Ito¹ (1.Osaka Univ.)