The 64th JSAP Spring Meeting, 2017

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[14a-213-1~12] 6.4 Thin films and New materials

Tue. Mar 14, 2017 9:00 AM - 12:15 PM 213 (213)

Tamio Endo(Sagamihara Surface Lab.), Akifumi Matsuda(Titech)

9:30 AM - 9:45 AM

▲ [14a-213-3] Deposition of Yttria Stabilized Zirconia (YSZ) Film on ZEOCOAT® Layer by Reactive Sputtering

〇(D)Mayeesha Masrura Haque1, Susumu Horita1 (1.Japan Adv. Inst. Sci. & Tech. (JAIST))

Keywords:Reactive Sputtering, YSZ thin film, X-ray diffraction

Yttrium Stabilized Zirconia (YSZ) has been reported to be effective to stimulate crystallization of amorphous Si (a-Si). ZEOCOAT® has good prospect as a thermal and electrical insulator in the field of flexible electronics for prevention of heat damage of organic substrates. YSZ films have been deposited on ZEOCOAT® layers with/without a thin metallic film by reactive sputtering using Ar and O2 as sputtering and reactive gases, respectively. The crystalline property of YSZ films on ZEOCOAT® layers with/without a metallic film has been studied using X-ray diffraction technique. It has been observed that direct deposition of YSZ on ZEOCOAT® produced an amorphous film while deposition of a thin metallic film on ZEOCOAT® promoted crystallinity of YSZ to some extent.