[14p-424-1~16] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-424-7] Ultra-Compact Electron Beam Direct Writing Machine: Electron Optical System and Nano-level Multi-axis Stage

〇Kazuya Kadota¹, Koji Kosaka² (1.Nano Science Lab, 2.TCK Inc.)

Keywords:Ultra-Compact Electron Beam Direct Writing Machine, Electron Optical System, Nano-level Multi-axis Stage

In order to respond to diversified and deeply developed semiconductors, MEMS, medical, biotechnology research and development, small volume multi-product production field is necessary which is completely different strategy from large scale Mega-Fabs. These market needs are the realization of miniaturization and thinning of the 100 nm node class and verification of principles related to new circuit design, device, integration process, element / material process, reliability, quality etc., and flexible small quantity multi-varieties products, which are supplied to the market through development and production. In order to fulfill this need, it is indispensable to use a small substrate different from the Mega-Fabs, a very small, inexpensive, lightly maintenance load, highly robust system.