[14p-P4-1~78] 17 Nanocarbon Technology（Poster）

[14p-P4-33] Devlopment of Maskless Photolithography and Spatially Resolved Electronic State on Cu/Graphene Micro Structure.

〇Kohei Maruyama¹, Ryoichi Mitsuhata¹, Yoshinobu Takahashi¹, Shun Konno¹, Naoka Nagamura², Masaharu Oshima³, Masato Kotsugi¹ (1.Tokyo Univ. of Sci., 2.NIMS, 3.The Univ. of Tokyo)

Keywords:Graphene, Maskless Photolithography, Scanning photoelectron microscopy

In order to control local electronic structure in patterned graphene devices, we developed maskless photolithography apparatus and prepared a graphene microstructure. We also analyzed local electronic structure by means of soft x-ray microscopy. By analyzing the ratio between main and contamination peaks in C 1s spectrum, the depth profile of contaminated layer of graphene was discussed. The result pointed out important notice for microfabrication process.