The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

CS Code-sharing session » CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[15a-423-1~9] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

Wed. Mar 15, 2017 9:00 AM - 11:30 AM 423 (423)

Atsushi Yokoo(NTT), Masaru Nakagawa(Tohoku University)

10:30 AM - 10:45 AM

[15a-423-6] Study on the Improvement of Antisticking Layer Resistance against Repeated UV nanoimprint

Shuso Iyoshi1, Makoto Okada1, Yuichi Haruyama1, Shinji Matsui1 (1.Hyogo univ. LASTI)

Keywords:UV nanoimprint, UV curable resin, durability of antisticking layer

With a repeated UV nanoimprinting test machine, the durability of mold antisticking layer (ASL) has been studied. It was revealed that the durability of ASL was engaged in condensable gases, fluorine surfactants, UV nanoimprinting conditions, ASL types, and UV curable resins of resist. This study was focused on UV curable resins of resist. A given UV curable resist was blended with the other UV curable resins having different chemical structures, and how the blend effected the durability of ASL was observe.