[15a-423-1~9] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[15a-423-7] Computational Study of Curing Characteristic in UV-NIL Based on Stochastic Model

〇Masanori Koyama¹, Masamitsu Shirai¹, Hiroaki Kawata¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Pref. Univ.)

Keywords:UV nanoimprint, curing characteristic, stochastic model

Recently, stochastic behavior of UV curing due to molecule distribution is one of the critical interests for UV nanoimprint lithography. In this work, we newly propose novel computational model based on simplified stochastic approach and evaluate UV curing characteristics. The chain reaction starts when monomer is activated by UV exposure. Then, the activated monomer reacts with another monomer within critical reaction radius and the monomers are chained with each other. Then, the other monomer is activated and the chain reaction occurs within reaction radius. By repeating this process, UV curing is modeled. Although the present simulation model is quite simple, the basic UV curing characteristics can be well described with the simulation.