Investigation on MoS2(1-x)Te2x Fabricated by Co-Sputtering and in-situ Annealing

Yusuke Hibino; Seiya Ishihara; Naomi Sawamoto; Takumi Ohashi; Kentarou Matsuura; Hideaki Machida; Hiroshi Sudoh; Hitoshi Wakabayashi; Atsushi Ogura

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Oral presentation

17 Nanocarbon Technology » 17.3 Layered materials

[15a-F203-1~8] 17.3 Layered materials

Wed. Mar 15, 2017 10:15 AM - 12:15 PM F203 (F203)

Ryouta Negishi(Osaka Univ.)

12:00 PM - 12:15 PM

△ [15a-F203-8] Investigation on MoS_2(1-x)Te_2xFabricated by Co-Sputtering and in-situ Annealing

〇Yusuke Hibino¹, Seiya Ishihara^1,4, Naomi Sawamoto¹, Takumi Ohashi², Kentarou Matsuura², Hideaki Machida³, Hiroshi Sudoh³, Hitoshi Wakabayashi², Atsushi Ogura¹ (1.Meiji Univ., 2.Tokyo Tech, 3.Gas-Phase Growth Ltd., 4.JSPS Research Fellow)

Keywords:Alloy, Layered Material

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Presentation information

[15a-F203-1~8] 17.3 Layered materials

△ [15a-F203-8] Investigation on MoS2(1-x)Te2x Fabricated by Co-Sputtering and in-situ Annealing

△ [15a-F203-8] Investigation on MoS_2(1-x)Te_2xFabricated by Co-Sputtering and in-situ Annealing