[15a-P8-1~31] 12.1 Fabrications and Structure Controls

[15a-P8-11] Solubility of Fullerene (C60) and It’s Film-forming properties by Mist deposition method

〇(B)Risako Taguchi¹, Shigetaka Katori¹, Shinya Oda², Toshimi Hitora² (1.NIT, Tsuyama College, 2.FLOSFIA INC.)

Keywords:fullerene

Fullerene is a spherical molecule with a graphite structure and has excellent electrical and mechanical properties. In particular, attention has been attracted as an n-type semiconductor material, and application to solar cells is being studied. However, since it is generally difficult to dissolve in a solution, a film is formed by a vacuum evaporation. Therefore, film formation by a solution process such as a spin coating or an inkjet printing method has been studied by improving solubility by using modified C60 such as PCBM. However, since the modified material is expensive, a film formation technique that can be used with unmodified fullerene is required. In this research, we focused on the mist deposition method, which enables fabrication of thin films under atmospheric pressure.
In the mist deposition method, the solubility of the material and the atomization characteristics when ultrasonic waves are applied affect film formation condition. Therefore solubility of fullerenes and atomization characteristics of four types of solvents were discussed. Film formation properties of fullerenes by mist vapor deposition were investigated using mesitylene and toluene, and film formation on a glass substrate was confirmed.