[15a-P8-1~31] 12.1 Fabrications and Structure Controls

[15a-P8-6] Evaluation of Rotary Cathode Al Sputtering Damage on the Alq₃ thin film

〇Toshiharu Uchida¹, Hiroki Sugawara¹, Takashi Takemi¹, Daisuke Aonuma¹ (1.Canon Tokki Corp.)

Keywords:Sputtering, Damage

We studied the sputtering damage evaluation by the intensity of photoluminescence (PL) to the Alq₃ film which was covered with the Al film by the sputtering of the rotary cathode. As results, the sputtering damage to the Alq₃ film has less dependency of the sputtering power and has the Ar gas pressure dependency that the damage is decreased as the pressure is reduced from 1.2Pa to 0.3Pa. Also we found that the thickness of Alq₃ film doesn’t change by the Al sputtering on the samples to compare the color coordinates of its PL spectrum to that of the Al evaporation sample.