The 64th JSAP Spring Meeting, 2017

Presentation information

Print

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[15p-311-1~18] 6.4 Thin films and New materials

Wed. Mar 15, 2017 1:15 PM - 6:15 PM 311 (311)

Kentaro Shinoda(AIST), Yoshinobu Nakamura(Univ. of Tokyo), Kyoko Namura(Kyoto Univ.)

4:45 PM - 5:00 PM

[15p-311-13] Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation

〇(B)Reika Ihara1, Naoya Tajima2, Hiroshi Murotani1, Shigeharu Matsumoto3 (1.Sch. of Eng., Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ., 3.SHINCRON Co., Ltd.,)

Keywords:optical thin film, sputtering and electron beam evaporation, low refractive index