The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

[15p-315-1~17] 13.8 Compound and power electron devices and process technology

Wed. Mar 15, 2017 1:15 PM - 5:45 PM 315 (315)

Naoteru Shigekawa(Osaka City Univ.), Hiroshi Okada(Toyohashi Univ. of Tech.)

5:15 PM - 5:30 PM

[15p-315-16] Continuous operation of double NO2 hole doping H-diamond MOS FETs

〇(M1)Kosuke Funaki1, Yuma Ishimatsu1, Satoshi Masuya1, Takayoshi Oshima1, Makoto Kasu1, Oishi Toshiyuki1 (1.Saga Univ.)

Keywords:Diamond, Field effect transistor (FET), Stress test

Diamond has high dielectric breakdown electric field, hole mobility and thermal conductivity, and is therefore expected as a next generation power device.However, it is reported that conventional hydrogen-terminated diamond MOSFETs deteriorate rapidly. We reported that the hydrogen terminated hole channel can be thermally stabilized with an Al 2 O 3 protective film. We report on the continuous operation of hydrogen terminated diamond MOSFET using Al 2 O 3 protective film this time.