[15p-512-1~9] Progress and outlook of nanoimprint technology

△ [15p-512-9] Investigation of leveling residual layer thicknesses for fabricating microelectrodes by Print and Imprint method

〇Kento Seki¹, Takahiro Nakamura¹, Shinya Sato¹, Mari Kumagai¹, Kazuro Nagase², Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ., 2.Mino Group Co.)

Keywords:ultraviolet nanoimprint lithography, screen printing, laser drilling

We demonstrated a ‘Print and Imprint’ method comprising screen printing of high-viscosity UV-curable resins and UV nanoimprinting for preparing resin patterns of micro- and nano-structures with a leveled residual layer thickness (RLT). Through-hole membrane masks for screen printing were fabricated by laser drilling of 12.5 mm-thick polyimide (PI) films using a picosecond pulsed laser. A UV-curable resin with a viscosity of 11,000 mPa s was deposited as droplets onto a Si substrate. The mean volume was 0.12 pL. Position selective placement of the resin droplets was also demonstrated by the ‘Print and Imprint’ method for application to filling mold recesses with various pattern densities.