9:15 AM - 9:30 AM
[16a-413-2] Theoretical study on interface orientation dependence of Si thermal oxidation ofVertical-BC-MOSFET with compressive strain
Keywords:semiconductor, Si thermal oxide film
Oral presentation
13 Semiconductors » 13.3 Insulator technology
Thu. Mar 16, 2017 9:00 AM - 12:15 PM 413 (413)
Takanobu Watanabe(Waseda Univ.), Kiyoteru Kobayashi(Tokai Univ.)
9:15 AM - 9:30 AM
Keywords:semiconductor, Si thermal oxide film