[16a-413-1~12] 13.3 Insulator technology

[16a-413-8] Thinning of high-k gate stack using new Flash Lamp Annealing (FLA) tool with low oxygen concentration (0.1ppm)

〇akitsugu Ueda¹, Hikaru Kawarazaki¹, Masashi Furukawa¹, Takayuki Aoyama¹, Shinichi Kato¹, Ippei Kobayashi¹ (1.SCREEN)

Keywords:Flash Lamp Anneal, High-k, Thinning