[16p-315-1~11] GFIS（電界電離ガスイオン源）ガスイオン顕微鏡技術とその材料・デバイス研究開発への応用：現状と今後の展望

▲ [16p-315-7] Single-nanometer patterning of graphene by HIM for advanced applications

〇水田 博¹、シュミット マレク¹、神崎 晃悠¹、小川 真一²、ムルガナタン マノハラン¹ (1.北陸先端大、2.産総研)

キーワード：graphene, helium ion beam, single-nanometer patterning

We report on the large-array processing of 100 nm wide monolayer CVD based suspended graphene structures by using focused helium ion beam. A ~6 nm wide suspended graphene nanoribbons (GNRs) are fabricated with electrical contacts, and the electrical transport characteristics are discussed along with their potential impact on the performance of graphene-NEMS-based single-molecular detection. We also demonstrate 9x9 arrays of 3-4 nanometer pores with pitch of ~9 nm patterned on suspended GNRs. The possibility of their application to nanoscale heat phonon engineering will be discussed.