Investigating Crystal Orientation of Sputtering Deposited MoS<sub>2</sub> Thin Film by Analyzing Scaling Behavior of The Surface Roughness

SEIYA ISHIHARA; BUNTA OHNO; YUSUKE HIBINO; NAOMI SAWAMOTO; TAKUMI OHASHI; KENTAROU MATSUURA; HITOSHI WAKABAYASHI; ATSUSHI OGURA

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Oral presentation

17 Nanocarbon Technology » 17.3 Layered materials

[16p-F203-1~15] 17.3 Layered materials

Thu. Mar 16, 2017 1:45 PM - 6:00 PM F203 (F203)

Keiji Ueno(Saitama Univ.), Kenzo Maehashi(TUAT)

2:15 PM - 2:30 PM

[16p-F203-2] Investigating Crystal Orientation of Sputtering Deposited MoS₂ Thin Film by Analyzing Scaling Behavior of The Surface Roughness

〇SEIYA ISHIHARA^1,3, BUNTA OHNO¹, YUSUKE HIBINO¹, NAOMI SAWAMOTO¹, TAKUMI OHASHI², KENTAROU MATSUURA², HITOSHI WAKABAYASHI², ATSUSHI OGURA¹ (1.Meiji Univ., 2.Tokyo Tech, 3.JSPS Research Fellow)

Keywords:Molybdenum disulfide

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Presentation information

[16p-F203-1~15] 17.3 Layered materials

[16p-F203-2] Investigating Crystal Orientation of Sputtering Deposited MoS2 Thin Film by Analyzing Scaling Behavior of The Surface Roughness

[16p-F203-2] Investigating Crystal Orientation of Sputtering Deposited MoS₂ Thin Film by Analyzing Scaling Behavior of The Surface Roughness