[16p-P3-1~23] 6.2 Carbon-based thin films

[16p-P3-17] High-aspect-ratio dry-etching process for diamond using SiO_x hard mask

〇Seita Beppu¹, Osamu Maida¹, Toshimichi Ito¹ (1.Osaka Univ.)

Keywords:diamond, etching, high aspect ratio