[16p-P8-1~23] 21.1 Joint Session K

[16p-P8-21] CuAlO₂ thin films by sputtering: Target preparation and structural change of target surface by sputtering

〇Takashi Ehara¹, Ryo Iizaka¹, Marina Abe¹, Kiyoaki Abe¹, Takuya Sato¹ (1.Ishinomaki Senshu Univ.)

Keywords:CuAlO2, sputtering

In this work, we prepared a powder, sputtering target, and thin films of of CuAlO₂. We observed structural change between 3R and 2H structure of CuAlO₂ in a plurality of processes of these preparation. In the powder preparation process, the powder heated for 30 hours show both 3R and 2H structures, and in the sample with the heating time of 40 hours shows only 3R structure which is thermodynamically stable. From the target surface part, the 2H structure of CuAlO₂ have been observed after sputtering.