[16p-P8-1~23] 21.1 Joint Session K

[16p-P8-3] Deposition of nonpolar ZnO films on single crystal NdGaO₃ substrates by RF sputtering

〇(B)Yuta Tanaka¹, Mio Sakuma¹, Takatoshi Ojima¹, Yuji Imai¹, Koji Kawasaki¹, Yasuhiro Kashiwaba¹, Takami Abe², Akira Nakagawa², Ikuo Niikura², Yasube Kashiwaba², Hiroshi Osada² (1.NIT, Sendai college, 2.Iwate Univ.)

Keywords:ZnO, Non-polar, sputtering

Non-polar ZnO(11-20) films were deposited on NdGaO₃ single crystal substrate by using an RF sputtering method. A diffraction peak of ZnO(11-20) plane were confirmed at 55.6 degree of the diffraction angle 2 theta.