[17a-313-1~10] 8.4 Plasma etching

△ [17a-313-4] Study on properties of hydrofluorocarbon gas plasma and etch performances of dielectric films

〇Naoki Takeda¹, Yan Zhang¹, Toshio Hayashi¹, Makoto Sekine¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji ishikawa¹, Masaru Hori² (1.Nagoya Univ. Eng., 2.Nagoya Univ. Inst. Innovation for Future Society)

Keywords:plasma, dielectric films etching