[17a-411-1~11] 6.1 Ferroelectric thin films

[17a-411-9] Fabrication of Ferroelectric Thick Films for Proton Beam Writing

Jun Hirade¹, 〇Masaki Yamaguchi^1,2, Yoichiro Masuda³ (1.Shibaura Inst. of Tech., 2.RCGI, Shibaura Inst. of Tech., 3.Hachinohe Inst. of Tech.)

Keywords:Ferroelectric, Proton Beam Irradiation, Thick Films

Fabrication of ferroelectric thick films, on a very small area of a substrate is an interesting technology from the viewpoint of future microelectric device processing. Proton beam writing is a new direct-writing technique that uses a focused beam of MeV protons to pattern a thick ferroelectric films. In this paper, we discuss bismuth-titanate thick-film deposition on silicon with MOD sloutions.